Application of metal cluster complex ion beam for low damage sputtering

Toshiyuki Fujimoto, T. Mizota, Hidehiko Nonaka, Akira Kurokawa, Shingo Ichimura

Surface and Interface Analysis · 2005 · 22 citations · 1 references

Concepts

Abstract

Abstract Metal cluster complexes, including the colloidal metal cluster, were applied to establish the low damage sputtering method. Electro‐spray‐like ionization using an ink‐jet nozzle has the potential to produce a cluster ion beam. A colloidal Au cluster of size 5 nm made a large crater‐like hole at the carbon sheet. Copyright © 2005 John Wiley & Sons, Ltd.

References

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