Deep‐UV transparent bulk single‐crystalline AlN substrates

Matthias Bickermann, Boris M. Epelbaum, Octavian Filip, Paul Heimann, Martin Feneberg, S. Nagata, A. Winnacker

Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 2010 · 36 citations · 2 references

Concepts

Abstract

Abstract Bulk aluminum nitride (AlN) is a very promising substrate material for ultraviolet (UV) and deep‐UV optoelectronics. Bulk AlN crystals grown using multiple sublimation of the source material show plain absorption coefficients below 18 cm –1 in the UV and deep‐UV range of 3.3–5.6 eV (380–220 nm) in the whole sample areas, regardless of sample orientation or light polarization direction. Homogeneity and polarization dependence of optical absorption in the UV and deep‐UV range of such samples is investigated. Finally, cathodoluminescence spectra of samples grown with and without multiple resublimation of the source material are compared. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

References

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