Applied Physics Letters · 1981 · 41 citations · 5 references
Materials ScienceEngineeringElectronic LevelCrystalline DefectsPhysicsIntrinsic ImpurityApplied PhysicsQuantum MaterialsCondensed Matter PhysicsElectron Paramagnetic ResonancePhysical ChemistrySemiconductor MaterialDefect FormationInterstitial CrSilicon On InsulatorElectronic StructureSolid-state PhysicEnergy Levels
The electronic level of interstitial Cr in silicon according to the transition Cr0i→Cr+i(3d6→3d5) was determined by correlating the electron paramagnetic resonance (EPR) signal of Cr+ to Hall measurements on identical samples. The procedure gives the donor level located at Ec −0.222±0.005 eV. From the experiments may be inferred that there is no Cr++i state above Ev +0.05 eV. The solubility of interstitial Cr in silicon is retrograde at 1300° and has a maximum value of 5×1015 cm−3.
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Properties of Gold-Doped Silicon
C. B. Collins, R. O. Carlson, C. J. Gallagher · Physical Review · 1957 · 261 citations
Spin Resonance of Transition Metals in Silicon
H. H. Woodbury, Günther Ludwig · Physical Review · 1960 · 182 citations
Transition metal deep centers in GaAs, GaP and Si
D. L. Partin, J.W. Chen, A. G. Milnes et al. · Solid-State Electronics · 1979 · 19 citations