Room-temperature magnetism in Cr-doped AlN semiconductor films

Abstract

Synthesis and characterization of magnetic semiconductors Al1−xCrxN, in which the atomic fraction of chromium x is up to 0.357, are reported. The films, grown by reactive co-sputtering on silicon, glass, and kapton substrates, have a crystal structure of aluminum nitride. Magnetic and transport properties were studied in the temperature range of 50 to 340 K. The materials are in the dielectric regime and have variable-range-hopping type of conductance. The films are ferromagnetic at temperatures over 340 K.