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Comparison of pulsed and CW regimes of MPACVD reactor operation

DOI

13

Citations

8

References

2003

Year

A. L. Vikharev, V. A. Koldanov, D. B. Radishchev, T.A. Grotjohn, S. Zuo, J. Asmussen
Diamond and Related Materials

References

YearCitations

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Journal of Applied Physics

1993

241

Investigation of chemical kinetics and energy transfer in a pulsed microwave H<sub>2</sub>/CH<sub>4</sub>plasma

K. Hassouni, Xavier Duten, Antoine Rousseau,

Plasma Sources Science and Technology

2001

62

Numerical modeling of a microwave plasma CVD reactor

V. A. Koldanov, A. L. Vikharev

Diamond and Related Materials

2001

41

The effect of frequency and duty cycle of a pulsed microwave plasma on the chemical vapor deposition of diamond

Joe Khachan, Dennis F. Gardner

Journal of Applied Physics

1999

22

Time-resolved plasma diagnostics for a better understanding of the improvement of pulsed MWPACVD of diamond

Ludovic de Poucques, J. Bougdira, R. Hugon,

Journal of Physics D Applied Physics

2001

22

Fabrication of diamond films at low temperature by pulse-modulated magneto-active microwave plasma CVD

Akimitsu Hatta, H. Suzuki, K. Kadota,

Plasma Sources Science and Technology

1996

22

Growth of diamond in a pulsed microwave discharge

J. Laimer, M. Shimokawa, Shinya Matsumoto

Diamond and Related Materials

1994

19

Diamond growth enhancement in d.c. discharge CVD reactors. Effects of noble gas addition and pulsed mode application

Yu. A. Mankelevich, A. T. Rakhimov, Svetlana V. Kostyuk

Diamond and Related Materials

1996

14

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