Highly conductive and transparent zinc oxide films prepared by rf magnetron sputtering under an applied external magnetic field

Abstract

Highly conductive films of zinc oxide have been prepared by rf magnetron sputtering deposition on a substrate suspended perpendicular to the target under an applied external magnetic field in pure argon gas. It is shown that a film with low resistivity (5×10−4 Ω cm) and high optical transmission (>85% between 400 and 800 nm) can be produced on low-temperature substrates with a relatively high deposition rate. The sheet resistance and Hall mobility of the film are 10 Ω/⧠ and 120 cm2/Vs respectively. The high conductivity is achieved by an increase in Hall mobility due to improved crystallization.