Electron Beam‐Induced CVD of Nanoalloys for Nanoelectronics

Abstract

Among various multi‐metal combinations, Au‐Fe nanoalloys are envisaged as prospective materials for data storage applications. Here we report on the first successful achievement of Au‐Fe nanoalloys using focused electron beam‐induced deposition (FEBID), exploiting the possibility of directly writing nanostructures at nanometer resolution. Gaseous organometallic precursors are injected simultaneously into the deposition chamber to co‐deposit Fe and Au within the same nanostructure. Fabricated nanostructures show a spatially uniform elemental ratio of iron to gold that can be tailored by experimental conditions.