Electron beam-induced deposition of tungsten

David A. Bell, John L. Falconer, Zhiming Lü, Carol M. McConica

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 13 citations · 0 references

Concepts

Abstract

Tungsten films were deposited by decomposing films of frozen tungsten hexafluoride (WF6) with an electron beam and then warming the substrate to remove unreacted WF6. Deposition rates increase with increasing beam intensity.