Publication | Closed Access
Ultra low energy (100–2000 eV) boron implantation into crystalline and silicon-preamorphized silicon
28
Citations
19
References
1991
Year
Materials ScienceSemiconductor TechnologyBoron NitrideElectronic DevicesEngineeringUltra Low EnergyBoron ImplantationApplied PhysicsSemiconductor Device FabricationSilicon-preamorphized SiliconSilicon On InsulatorMicroelectronics
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