Publication | Closed Access
Heteroepitaxy of ZnO on GaN and its implications for fabrication of hybrid optoelectronic devices
438
Citations
14
References
1998
Year
Materials ScienceElectrical EngineeringElectronic DevicesEngineeringOxide ElectronicsOptoelectronic MaterialsApplied PhysicsAluminum Gallium NitrideGan Power DeviceHybrid Optoelectronic DevicesGallium OxideOptoelectronic DevicesIon ChannelingSharp InterfaceOptoelectronicsCategoryiii-v SemiconductorZno Thin Films
ZnO thin films have been grown heteroepitaxially on epi-GaN/sapphire (0001) substrates. Rutherford backscattering spectroscopy, ion channeling, and high resolution transmission electron microscopy studies revealed high-quality epitaxial growth of ZnO on GaN with an atomically sharp interface. The x-ray diffraction and ion channeling measurements indicate near perfect alignment of the ZnO epilayers on GaN as compared to those grown directly on sapphire (0001). Low-temperature cathodoluminescence studies also indicate high optical quality of these films presumably due to the close lattice match and stacking order between ZnO and GaN. Lattice-matched epitaxy and good luminescence properties of ZnO/GaN heterostructures are thus promising for ultraviolet lasers. These heterostructures demonstrate the feasibility of integrating hybrid ZnO/GaN optoelectronic devices.
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