Applied Physics Letters · 1991 · 44 citations · 2 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsThin FilmsEtching ProcessesLaser Surface ProcessingOxide SemiconductorsThin Film EtchingThin Film Thermal PropertiesTransparent Conducting OxidesExcimer LasersFluorine-doped Tin OxideLaser AblationLaser FluenceLaser PatterningSheet ResistanceTransparent Conducting MaterialsTransparent Conductive Oxides
Laser etching of transparent conducting films of fluorine-doped tin oxide and indium-tin oxide has been investigated using an excimer laser at 248 nm. The etch depth per pulse as a function of laser fluence was measured and compared with the predictions of an explicit finite difference thermal model. Direct laser patterning of these films was demonstrated. The sheet resistance of a 50-μm-wide conducting channel formed by laser ablation was measured and compared with the value for the original film.
2
Pulsed laser etching of high <i>T</i> <i>c</i> superconducting films
A. Inam, X. D. Wu, T. Venkatesan et al. · Applied Physics Letters · 1987 · 174 citations
Natural Sciences, Materials Engineering, Materials Science +17