Determination of the nanoscale dielectric constant by means of a double pass method using electrostatic force microscopy

Abstract

We present a method to determine the local dielectric permittivity of thin insulating layers. The measurement is based on the detection of force gradients in electric force microscopy by means of a double pass method. The proposed experimental protocol is simple to implement and does not need any modification of standard commercial devices. Numerical simulations based on the equivalent charge method make it possible to carry out quantification whatever the thickness of film, the radius of the tip, and the tip-sample distance. This method has been validated on a thin SiO2 sample for which the dielectric permittivity at the nanoscale has been characterized in the literature. We also show how we can quantitatively measure the local dielectric permittivity for ultrathin polymer film of poly(vinyl acetate) and polystyrene.