New Precursors for the Organometallic Chemical Vapor Deposition of Aluminum Nitride

Epitaxially grown AlN and its optical band gap

Woosoon Yim, E. J. Stofko, P. J. Zanzucchi et al. · Journal of Applied Physics · 1973 · 600 citations

Natural Sciences, Materials Engineering, Materials Science +17

The Use of Metalorganics in the Preparation of Semiconductor Materials

H. M. Manasevit, F. M. Erdmann, W. I. Simpson · Journal of The Electrochemical Society · 1971 · 296 citations

Engineering, Chemistry, Materials Science +12

Mechanistic Studies of Chemical Vapor Deposition

Joseph M. Jasinski, B.S. Meyerson, B. A. Scott · Annual Review of Physical Chemistry · 1987 · 231 citations

Natural Sciences, Chemical Engineering, Chemistry +15

The Polymerization of Some Derivatives of Trimethylaluminum

Norman Davidson, Herbert C. Brown · Journal of the American Chemical Society · 1942 · 171 citations

Natural Sciences, Chemistry, Materials Science +6

Organometallic azides as precursors for aluminum nitride thin films

David C. Boyd, Richard T. Haasch, Daniel R. Mantell et al. · Chemistry of Materials · 1989 · 90 citations

Natural Sciences, Chemistry, Materials Science +15