Reliable small via interconnects made of multiple sub-micron wires in flexible PCB

Abstract

A fabrication process for small through-hole vias consisting of multiple sub-micron electrodeposited wires has been developed for flexible printed circuit boards (PCB). The resistance of the vias is controlled by adjusting the number of wires per via, as well as the dimensions of the wires. The process steps include modification of the foils by irradiation with energetic ions, wet etching and metallization of the through-hole vias, double-sided surface metallization of the dielectric layer and interconnection lithography. Series of up to 360 interconnected vias of electrodeposited nickel are demonstrated in a flexible PCB foil (75 µm Kapton HN polyimide). The vias have a lateral size of 26 µm. The metal content of the demonstrated vias is 0.12% and 10% of their total volume, corresponding to a metal cross-section of 3.2 µm2 and 270 µm2, respectively. The electrical resistance per interconnected via is 2.6 Ω and 0.07 Ω, respectively. The vias can carry a current density of at least 4 × 106 A cm−2.