Publication | Closed Access
Laser scanner for direct writing lithography
49
Citations
3
References
1989
Year
Laser ScannerAdvanced Laser ProcessingEngineeringElectron-beam LithographyBeam LithographyMicrofabricationMicroscopyFabrication TechniqueApplied PhysicsNanolithographyLaser-assisted DepositionMicromachiningMicro-optical ComponentMicroelectronicsStepping Xy StageDirect Writing LithographyNanolithography Method
A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 microm are presented.
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