MOCVD and ALD of CeO₂ Thin Films using a Novel Monomeric Ce^IV Alkoxide Precursor

Abstract

The novel monomeric Ce(IV) alkoxide [Ce(mmp)4] (mmp = OCMe2CH2OMe) (see crystal structure) has been synthesized and structurally characterized. It has been used successfully as a precursor for the deposition of high-purity CeO2 thin films by liquid-injection MOCVD and ALD.