Publication | Closed Access
Influence of the dopant species on radiation-induced defects in Si single crystals
23
Citations
10
References
2000
Year
EngineeringRadiation-induced DefectsSilicon On InsulatorDefect TolerancePhotovoltaicsSemiconductor DeviceMev Electron IrradiationSemiconductorsElectronic DevicesDeep LevelsSi Single CrystalsSemiconductor TechnologyDopant SpeciesElectrical EngineeringPhysicsCrystalline DefectsSingle Event EffectsCombined BoronSemiconductor MaterialSemiconductor Device FabricationDefect FormationApplied PhysicsSolar Cell Materials
Observations on deep levels introduced in silicon by 1 MeV electron irradiation are reported using boron- or gallium-doped Czochralski (CZ) grown Si space solar cells with different doping concentrations, deep level transient spectroscopy analysis has been carried out to detect the radiation-induced deep levels. Present results provide evidence for new defect states in addition to those previously reported in gallium- and boron-doped Si. The combined boron and gallium data provide enough information to gain valuable insight into the role of the dopants on radiation induced defects in Si. The dominant donor-like electron level at EC−0.18 eV in boron-doped Si has not been observed in gallium-doped CZ-grown Si. A noticeable suppressing generation of the radiation-induced defects in gallium-doped Si is also observed, especially hole level EV+0.36 eV, which is thought to acts as a recombination center.
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