Publication | Open Access
Sub-Micron Lithography Using InGaN Micro-LEDs: Mask-Free Fabrication of LED Arrays
35
Citations
13
References
2012
Year
EngineeringOptoelectronic DevicesIntegrated CircuitsMicro-optical ComponentBeam LithographyLight-emitting DiodesNanolithographyMicrofluidicsLed ArraysNanolithography MethodLight-emitting DiodeMaterials SciencePhotonicsElectrical EngineeringOptoelectronic MaterialsFabrication TechniqueNew Lighting TechnologyAluminum Gallium NitrideMicroelectronicsSolid-state LightingMicrofabricationApplied PhysicsMicron-sized LedsDirect Writing TechniqueOptoelectronicsOptical Devices
The fabrication of gallium-nitride (GaN)-based light-emitting diode (LED) arrays by a direct writing technique, itself using micron-sized LEDs (micro-LEDs), is reported. CMOS-driven ultraviolet GaN-based micro-LED arrays are used to pattern photoresist layers with feature sizes as small as 500 nm. Checkerboard-type square LED array devices are then fabricated using such photoresist patterns based on either single pixel or multipixel direct writing, and implemented as part of a completely mask-less process flow. These exemplar arrays are composed of either 450-nm-emitting 199 <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$\,\times\,$</tex></formula> 199 <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$\mu{\rm m}^{2}$</tex></formula> pixels on a 200- <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex Notation="TeX">$\mu{\rm m}$</tex></formula> pitch or 520-nm-emitting 21 <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$\,\times\,$</tex> </formula> 18 <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$\mu{\rm m}^{2}$</tex></formula> pixels on a 23- <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$\mu{\rm m}$</tex></formula> pitch. Fill factors of 99% and 71.5% are achieved with optical output power densities per pixel of 5 and 20 <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">${\rm W}/{\rm cm}^{2}$</tex></formula> at 90- and 6-mA dc-injected currents, respectively.
| Year | Citations | |
|---|---|---|
Page 1
Page 1