Residual stress in silicon dioxide thin films produced by ion-assisted deposition - Concepedia

Concepedia

Publication | Closed Access

Residual stress in silicon dioxide thin films produced by ion-assisted deposition

34

Citations

10

References

1996

Year

J. Y. Robic, Hervé Leplan, Y. Pauleau, B. Rafin

Thin Solid Films

Materials ScienceEngineeringIon-assisted DepositionApplied PhysicsResidual StressThin Film Process TechnologyThin FilmsChemical DepositionChemical Vapor DepositionSilicon On InsulatorThin Film Processing

References

	Year	Citations

Page 1