Synthesis of i- and g-Line Sensitive Photoacid Generators and Their Application to Photopolymer Systems

Abstract

We synthesized a series of i- and g-line sensitive non-ionic photoacid generators (PAGs). Photolysis and catalytic properties of the PAGs were examined. Photoreactivity of the PAGs was evaluated using UV-vis spectroscopy. The PAGs were used for photocrosslinking of epoxy-based polymers. The PAGs were also applied to positive-type photoresist materials. Sensitivity profile of the photoresists containing PAGs was affected not only by the photosensitivity of PAGs but also by the acidity of the generated acid. Post-exposure delay of the photoresists was dependent on the molecular size of the generated acid.