Increase of cleaning rate and reduction in global warming effect during C4F8O/O2 remote plasma cleaning of silicon nitride by adding NO and N2O - Concepedia

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Increase of cleaning rate and reduction in global warming effect during C4F8O/O2 remote plasma cleaning of silicon nitride by adding NO and N2O

16

Citations

8

References

2003

Year

Chang Hyun Oh, Nae‐Eung Lee, Jaehoon Kim, G.Y. Yeom, Seong‐Sik Yoon, Taesoon Kwon

Thin Solid Films

Materials ScienceChemical EngineeringEngineeringNonthermal PlasmaPlasma CleaningHeat TransferGas Discharge PlasmaGlobal Warming EffectSilicon Nitride

References

	Year	Citations

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