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Benefits and side effects of high temperature anneal used to reduce threading dislocation defects in epitaxial Ge layers on Si substrates

Materials EngineeringMaterials ScienceEpitaxial GrowthEngineeringDislocation InteractionPhysicsHigh Temperature AnnealApplied PhysicsSide EffectsSemiconductor Device FabricationElectronic PackagingSilicon On InsulatorMicroelectronicsMolecular Beam EpitaxyDislocation Defects