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Visual-infrared electroluminescence emission from ZnO∕GaAs heterojunctions grown by metal-organic chemical vapor deposition
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Citations
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References
2007
Year
Optical MaterialsEngineeringOrganic ElectronicsSemiconductor MaterialsOptoelectronic DevicesChemistryLuminescence PropertySemiconductor NanostructuresSemiconductorsZno∕gaas HeterojunctionsChemical EngineeringElectronic DevicesLight-emitting DiodesThermally Activated Delayed FluorescenceCompound SemiconductorLight-emitting DiodeSemiconductor TechnologyZno FilmElectrical EngineeringPhotoluminescencePhotochemistryOxide ElectronicsOptoelectronic MaterialsThreshold VoltageVisual-infrared Electroluminescence EmissionWhite OledApplied PhysicsOptoelectronics
The light-emitting diode of p-ZnO∕n-GaAs heterojunction was grown by metal-organic chemical vapor deposition. The p-ZnO films have been formed by the doping As atoms which diffuse into ZnO film from GaAs substrate. The p-type behavior of As-doped ZnO films based on As-doped p-ZnO∕n-GaAs, p-ZnO∕p-GaAs heterojunction was studied by carrying out I-V measurements and x-ray photoelectron spectroscopy. The I-V characteristic of p-ZnO∕n-GaAs heterojunction showed characteristic of rectifying diode and visual-infrared electroluminescence emission under forward current injection at room temperature. The I-V of the heterounction had a threshold voltage of ∼2.5V.
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