Influence of ion-implanted titanium on the performance of edge-defined, film-fed grown silicon solar cells

J. T. Borenstein, J. I. Hanoka, B. Bathey, J.P. Kalejs, S. Mil’shtein

Applied Physics Letters · 1993 · 15 citations · 5 references

Concepts

Abstract

The electrical properties of edge-defined, film-fed grown and Czochralski silicon solar cells ion implanted with titanium have been investigated using deep level transient spectroscopy. In both types of solar cell materials, the observed degradation in cell performance is associated with the Ti deep level reported in earlier studies. During the cell fabrication sequence, Ti in-diffuses into the bulk of the sample, creating a low-lifetime zone extending beneath the junction. Solar cell modeling, based on the extent of the titanium-diffused layer and the properties of the Ti center, is in excellent agreement with observed cell performance.

References

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