Concepedia

The dependence of deposition rate on power input for dc and rf magnetron sputtering

A. R. Nyaiesh, L. Holland

Vacuum · 1981 · 30 citations · 1 references

DOI

Concepts

References

1

Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixtures

S. Maniv, W. D. Westwood · Journal of Vacuum Science and Technology · 1980 · 114 citations

, , +13