The effect of reactant gas composition on the plasmaenhanced chemical vapour deposition of TiN

Practical Scanning Electron Microscopy

Timothy K. Maugel, Joseph I. Goldstein, H. Yakowitz · Transactions of the American Microscopical Society · 1976 · 176 citations

Natural Sciences, Materials Engineering, Materials Science +6

Quantitative auger electron analysis of titanium nitrides

P. T. Dawson, K.K. Tzatzov · Surface Science · 1985 · 137 citations

Natural Sciences, Chemistry, Materials Science +13

Characterization of nitride coatings by Auger electron spectroscopy and x‐ray photoelectron spectroscopy

S. Hofmann · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 133 citations

Natural Sciences, Materials Engineering, Materials Science +17

The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−x

N.J. Archer · Thin Solid Films · 1981 · 117 citations

Natural Sciences, Materials Engineering, Materials Science +11

Kinetics of nitride formation on titanium targets during reactive sputtering

J.‐E. Sundgren, B.-O. Johansson, Susanne Karlsson · Surface Science · 1983 · 105 citations

Natural Sciences, Materials Engineering, Materials Science +14