Publication | Closed Access
Low threading dislocation density Ge deposited on Si (100) using RPCVD
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Citations
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References
2011
Year
Materials EngineeringMaterials ScienceDefect ToleranceDislocation Density GeEngineeringDislocation InteractionPhysicsApplied PhysicsDefect FormationSemiconductor Device FabricationElectronic PackagingSilicon On InsulatorMicroelectronics
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