Gibbs-Thomson and diffusion-induced contributions to the growth rate of Si, InP, and GaAs nanowires

Abstract

We present a general model for the vapor-liquid-solid nanowire (NW) growth rates which accounts for adatom diffusion from the substrate and sidewalls into the Au catalyst drop as well as the Gibbs-Thomson effect of elevated chemical potential in the drop with a curved surface. The growth model is compared with the experimental length-diameter dependences for InP and Si NWs grown via metal organic chemical vapor deposition (MOCVD) and GaAs nanowires grown via molecular beam epitaxy (MBE). We show that MBE growth is affected mainly by adatom diffusion from the substrate, whereas MOCVD growth is affected mainly by direct Au drop impingement and sidewall diffusion. The Gibbs-Thomson effect is shown to limit growth for smaller diameter nanowires. Fits for diffusion lengths and the Gibbs-Thomson radii are determined which explain the experimental length-diameter dependence observed.