Sub-atomic-layer epitaxy of Si using Si2H6 - Concepedia

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Sub-atomic-layer epitaxy of Si using Si2H6

11

Citations

10

References

1994

Year

Yoshiyuki Suda, Masahiro Ishida, Mitsutomi Yamashita, Hiroaki Ikeda

Applied Surface Science

Applied PhysicsSub-atomic-layer EpitaxyMolecular Beam EpitaxySilicon On InsulatorEpitaxial Growth

References

	Year	Citations

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