Analysis Of Linewidth Measurement Techniques Using The Low Voltage SEM

Abstract

Linewidth measurement using the scanning electron microscope is not well understood. The basic intent is to measure the size of a structure from the secondary and backscattered electron signal generated by that structure^1-6. Thus, an accurate measurement requires an understanding of how the profile and critical dimension of the line being measured relate to the electron signal. The complicating factor is that different features generate different signals and that surroundings often influence the detected signal from a given feature.