Publication | Closed Access
GaN metal-oxide-semiconductor field-effect-transistor with atomic layer deposited Al2O3 as gate dielectric
36
Citations
14
References
2006
Year
Gan Metal-oxide-semiconductor Field-effect-transistorElectrical EngineeringEngineeringApplied PhysicsAluminum Gallium NitrideGan Power DeviceAtomic LayerGate DielectricSemiconductor Device
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