Publication | Closed Access
X-ray lithography: On the path to manufacturing
34
Citations
0
References
1989
Year
EngineeringElectron-beam LithographyIntegrated CircuitsX-ray ImagingBeam LithographyIntegrated SystemRadiation ImagingHealth SciencesMaterials ScienceElectrical EngineeringNanomanufacturingFabrication TechniqueComputer EngineeringX–ray LithographySynchrotron RadiationMicroelectronics3D PrintingMicrofabricationApplied PhysicsX-ray LithographyBeyond Cmos
X-ray lithography has been an active area of research and development for the last 20 years, and recent spectacular results using complete, integrated x-ray lithography systems have demonstrated, at the research level, the viability of x-ray lithography, and have shown that x–ray lithography is on the path to manufacturing. This paper presents IBM’s recent successful development of a synchrotron-radiation-based x-ray lithography system. The individual components of the system are described, along with a brief description of available alternate components. Measurements of the lithographic performance of the integrated system are presented, and the use of this system for the fabrication of fully-scaled 0.5 μm CMOS circuits is described.