Publication | Closed Access
Silicon nitride film growth by remote plasma CVD using Tris(dimethylamino)silane
29
Citations
6
References
1998
Year
Electrical EngineeringEngineeringSurface ScienceApplied PhysicsRemote Plasma CvdChemical Vapor DepositionPlasma EtchingPlasma ProcessingSilicon On Insulator
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