Publication | Open Access
Sub-100 nm nanostructuring of silicon by ultrashort laser pulses
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2005
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EngineeringMicroscopyLaser AblationSilicon On InsulatorUltra-short Laser PulsesLaser Micro-processingPeriodic StructuresUltra-short LasersMaterials SciencePhotonicsPhysicsSub-100 Nm NanostructuringLaser Processing TechnologyLaser-assisted DepositionAdvanced Laser ProcessingMicrofabricationApplied PhysicsNanofabrication70-100Nm Spacing
Techniques based on laser scanning microscopes for nanoprocessing of periodic structures on silicon with ultra-short laser pulses have been developed. Ripples of 800-900 nm spacing were obtained after laser irradiation at a wavelength of 1040 nm, a repetition rate of 10 kHz and a fluence of 2 J/cm2 in air. Smaller features of 70-100nm spacing were achieved in oil at a wavelength of 800 nm, a repetition rate of 90 MHz and a fluence of 200-300 mJ/cm2 by using a high numerical focusing objective.