Study of Shockley partial dislocation mobility in highly N‐doped 4H‐SiC by cantilever bending

Hosni Idrissi, G. Regula, M. Lancin, J. Douin, B. Pichaud

Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 2005 · 23 citations · 0 references

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Abstract

Well-controlled population of dislocations are introduced in 4H-SiC by bending in cantilever mode and annealing at temperature ranging from 400 °C to 700 °C. The introduced-defects consist of double stacking faults (DSFs) bound by 30° Si(g) partial dislocations. Their expansion is asymmetric with a velocity directly measured on the surface of KOH etched-samples after deformation. Values of the activation energy and the stress exponent are given, and the formation of DSFs is discussed. (© 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)