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High-efficiency GaAs lo-hi-lo IMPATT devices by liquid phase epitaxy for <i>X</i> band
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Citations
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References
1974
Year
SemiconductorsWide-bandgap SemiconductorElectrical EngineeringElectronic DevicesEngineeringRf SemiconductorSemiconductor DeviceSemiconductor TechnologyNanoelectronicsApplied PhysicsNarrow Spike StructuresLiquid Phase EpitaxyMolecular Beam EpitaxyMicroelectronicsOptoelectronicsCategoryiii-v SemiconductorCompound SemiconductorQuasistatic Computer Simulation
n-n+-n epitaxial triple layers were grown by liquid phase epitaxy to fabricate lo-hi-lo GaAs IMPATT devices. The best diode gave 35.6% cw efficiency with 2.9-W output power at 10.4 GHz. From a group of 151 devices, 51% had better than 22% efficiency with an average output power of 2.8 W at 10 GHz. Operating voltages varied between 40 and 55 V. A theoretical efficiency of 46% was calculated for narrow spike structures using a quasistatic computer simulation.
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