Publication | Closed Access
Thickness determination for SiO2 films on Si by X-ray reflectometry at the Si K edge
28
Citations
10
References
2004
Year
Materials ScienceSi K EdgeEngineeringSurface ScienceApplied PhysicsSiliceneSemiconductor Device FabricationThickness DeterminationThin FilmsSilicon On InsulatorSio2 FilmsThin Film Processing
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