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Reliability characteristics of high-K gate dielectrics HfO2 in metal-oxide semiconductor capacitors

Electrical EngineeringSemiconductor DeviceEngineeringMetal-oxide Semiconductor CapacitorsBias Temperature InstabilityApplied PhysicsTime-dependent Dielectric BreakdownReliability CharacteristicsCircuit ReliabilityDevice ReliabilityMicroelectronicsElectrical Insulation