Publication | Closed Access
Work function measurements during growth of ultra thin films of SiO2 on characterized silicon surfaces
18
Citations
10
References
1984
Year
Materials ScienceWork Function MeasurementsEngineeringNanoelectronicsSurface ScienceApplied PhysicsSiliceneSemiconductor Device FabricationUltra Thin FilmsThin FilmsSilicon On InsulatorCharacterized Silicon SurfacesThin Film Processing
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