P -type doping of GaAs nanowires

Abstract

Gallium arsenide (GaAs) nanowires with diameters of 150nm have been grown via metal-organic vapor deposition and were subsequently implanted with Zn64 ions. The amorphized nanowires were annealed at 800°C under arsenic overpressure resulting into a full recrystallization of the nanowires as well as an activation of the implanted acceptors. Consequently, we observe a strong increase in conductivity of the GaAs:Zn nanowires, where a simple estimation of the activated acceptors matches the implantation concentration.