Energy-dispersive, x-ray reflectivity density measurements of porous SiO2 xerogels

Abstract

X-ray reflectivity has been used to measure nondestructively the density of thin, porous, silica xerogels used for interlayer dielectric applications. The critical angle, defined through total external reflection, was measured for multiple x-ray energies to correct for sample misalignment error in the determination of the density for the films. This density was used to extrapolate the percentage porosity, assuming a bulk SiO2 density standard. The results were compared to those obtained by Rutherford backscattering and ellipsometry techniques.