High performance gallium-zinc oxynitride thin film transistors for next-generation display applications

Abstract

High speed thin film transistors (TFTs) are in great need for next-generation TVs which will employ ultra high definition resolution (3840×2160) panels and possibly include multi-view autostereoscopic 3D technology which will negate the use of glasses for 3D viewing mode. In order to achieve high mobility devices, various types of metal oxide semiconductors have been extensively studied, including the most popular In-Ga-Zn-O, with typical field effect mobilities ranging between 10 to 30 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> /Vs. Although these numbers are much higher than that of conventional amorphous silicon (0.5∼1.0 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> /Vs) TFTs, there is a strong demand for even higher mobility semiconductors which can exhibit excellent uniformity over a large area.