Electronics Letters · 1989 · 21 citations · 0 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsLaser DiodesLaser PhysicsQuantum ConfinementSemiconductor HeterostructuresSemiconductor LasersSemiconductor PhysicsCarrier Confinement In Quantum WellsDifferential EfficiencyDifferential Quantum EfficiencyHeterostructure LasersMetalorganic Chemical Vapor DepositionQuantum EfficiencyQuantum Well LasersQuantum Well Structures
We report the first successful demonstration of a 1.3 μm GaInAsP/InP buried heterostructure graded index separate confinement multiple quantum well laser (BH-GRIN-SCMQW LD) entirely grown by three-step low pressure metalorganic chemical vapour deposition (LP-MOCVD). The threshold current and the differential quantum efficiency were 31 mA (threshold current density 3.4kA/cm2) and 28%/facet, respectively. A characteristic temperature of 65 K was obtained.