Extremely high-aspect-ratio patterns in macroporous substrate by focused-ion-beam etching: the realization of three-dimensional lattices - Concepedia

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Extremely high-aspect-ratio patterns in macroporous substrate by focused-ion-beam etching: the realization of three-dimensional lattices

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2003

Year

Kang Wang, A. Chelnokov, S. Rowson, J.-M. Lourtioz

Applied Physics A

Materials EngineeringMaterials ScienceEngineeringElectron-beam LithographyBeam LithographyMicrofabricationSurface ScienceApplied PhysicsMacroporous SubstratePlasma EtchingNanolithography MethodThree-dimensional LatticesFocused-ion-beam Etching

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