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High-performance flexible zinc tin oxide field-effect transistors
249
Citations
9
References
2005
Year
EngineeringField-effect TransistorsThin Film Process TechnologySemiconductor DeviceElectronic DevicesElectronic EngineeringFlexible TransistorsThin Film ProcessingMaterials ScienceElectrical EngineeringOxide ElectronicsSemiconductor Device FabricationMicroelectronicsFlexible PolyimideElectronic MaterialsFlexible ElectronicsApplied PhysicsZinc Tin OxideThin Films
Flexible transistors were fabricated by sputter deposition of zinc tin oxide (ZTO) onto plasma-enhanced chemical vapor deposition gate dielectrics formed on flexible polyimide substrates with a blanket aluminum gate electrode. The flexible transistors exhibited high on-currents of 1mA, on/off ratios of 106, subthreshold voltage slopes of 1.6V/decade, turn-on voltages of −17V, and mobilities of 14cm2V−1s−1. Capacitance measurements indicate that the threshold voltage and subthreshold slope are primarily influenced by residual doping in the ZTO rather than by defects at the semiconductor/dielectric interface, and are useful for assessing contact resistance.
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