Journal of Applied Physics · 1990 · 94 citations · 19 references
Natural SciencesMaterials SciencePhysicsCondensed Matter PhysicsSemiconductor MaterialsSurface ScienceEpitaxial GrowthSemiconductor Crystal GrowthSemiconductor InterfacesSemiconductor PhysicsSemiconductor SurfacesSurface CrystallographyAtomic Layer EpitaxyDiffraction Pattern AnalysisElectron Diffraction Of Modulated StructuresEpitaxial MaterialsMolecular Beam EpitaxyMonolayer FilmsPatternsTransmission Electron Diffraction
Transmission electron diffraction (TED) was used to observe extra diffraction spots in the TED patterns of molecular beam epitaxial GaAs1−y Sby layers with y=0.25, 0.50, and 0.71 grown at 520 °C on (001) GaAs substrates. Half-order diffraction spots in the TED patterns indicated ordering on the (1̄11) and (11̄1) planes of the Group V sublattice, and streaks with subsidiary spots indicated a modulation in the [110] direction with a periodicity of ∼4d110 . Streaks in the [001] direction indicated monolayer disruptions of the {111} ordering and the [110] modulation in the [001] direction. As the composition parameter y varied, there were progressive changes in the {111} ordering, the [110] modulation, and the [001] disruptions, and these correlated with corresponding changes in the reconstruction of the dangling bonds at the growing layer surface, as determined by reflection high-energy electron diffraction. A model is proposed to explain the observed effects in terms of ordered atomic arrangements of the Group V atoms resulting from the surface reconstruction being incorporated into the bulk epitaxial layers.
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