Langmuir probe and optical emission studies in a radio frequency (rf) magnetron plasma used for the deposition of hydrogenated amorphous silicon

Optical techniques in plasma diagnostics

Richard A. Gottscho, Terry A. Miller · Pure and Applied Chemistry · 1984 · 154 citations · Full text

Natural Sciences, Physics, Optics +12

The distribution of ion energies at the substrate in an asymmetric bi-polar pulsed DC magnetron discharge

James W. Bradley, H. Bäcker, Yolanda Aranda-Gonzalvo et al. · Plasma Sources Science and Technology · 2002 · 150 citations · Full text

Natural Sciences, Physics, Analytical Chemistry +8

Spatial survey of a magnetron plasma sputtering system using a Langmuir probe

David Field, S. K. Dew, Robert Burrell · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2002 · 59 citations · Full text

Natural Sciences, Physics, Condensed Matter Physics +16

Raman study of the network disorder in sputtered and glow discharge <i>a</i>-Si:H films

Gerardo Morell, Ram S. Katiyar, S. Z. Weisz et al. · Journal of Applied Physics · 1995 · 56 citations

Natural Sciences, Materials Science, Physics +17

Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar∕O2 mixtures

Jon M. Andersson, Erik Wallin, E. P. Münger et al. · Journal of Applied Physics · 2006 · 56 citations · Full text

Natural Sciences, Materials Science, Physics +14