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Monte Carlo simulation of the growth of <i>A</i><sub>1−<i>x</i></sub><i>B</i><sub><i>x</i></sub> layers on lattice‐matched substrates in molecular beam epitaxy
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1982
Year
EngineeringCrystal Growth TechnologyThin Film Process TechnologyChemical DepositionLocal EnvironmentLattice‐matched SubstratesMolecular Beam EpitaxyEpitaxial GrowthAlloy FilmsThin Film ProcessingMaterials ScienceSurface MobilitiesPhysicsCrystalline DefectsMonte-carlo ModellingMonte Carlo SimulationSurface ScienceApplied PhysicsCondensed Matter PhysicsThin FilmsChemical Vapor Deposition
We report some results of the first study of the influence of growth parameters on the nature of alloy films grown under ultrahigh vacuum deposition techniques such as MBE. Monte‐Carlo methods are employed to elucidate the interplay between rate of impingement, sticking coefficients (S), and surface mobilities ( μ) in governing disorder and clustering effects. The local environment, and consequently coverage dependence of S and μ, are found to significantly influence the growth process and the nature of the resulting film.