Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 12 citations · 0 references
EngineeringElectrical EngineeringInstrumentationMetrologyOpticsDisplacement MeasurementDistance MeasurementInterferometryMeasurement UncertaintyOptical InstrumentationOptical MetrologyAccuracyInterferometric Length MeasurementInterferometric MeasurementInterferometric MetrologyOptical InterferometersOptical InterferometrySystematic Errors
Visible interferometry at µarc-second accuracy requires measurement of the interferometric baseline length and orientation at picometer accuracy. The optical metrology instruments required for these interferometers must achieve accuracy on order of 1 to 10 picometers. This paper discusses the progress in the development of optical interferometers for use in distance measurement gauges with systematic errors below 100 picometers. The design is discussed as well as test methods and test results.