Mass thickness measurement of pure element films by X‐ray fluorescence spectroscopy

Abstract

Abstract A precise and rapid method of measuring the mass thickness of pure element films using the LAMA Program to generate calibration curves by the fundamental parameters method is described. Only thick (‘bulk’) pure element standards are required thereby eliminating the necessity of preparing thin film standards. The accuracy is comparable to routine interferometry. A table giving the intensity ratios of the thin film to the corresponding thick standard is given for eighteen common elements and a thickness range of 500–100 000 Å, making it possible to apply the method without use of a computer.